HM2E32PH5000LF

Amphenol ICC (FCI)'s HM2E32PH5000LF represents a breakthrough in Backplane Connectors - Hard Metric, Standard technology for industrial automation systems. Developed for harsh operating conditions, this connector family combines robust mechanical design with advanced signal integrity features. The innovative contact system ensures reliable performance in factory automation and robotic applications where dust exposure and mechanical stress are common challenges.The Receptacle, Female Sockets interface incorporates self-cleaning contact geometry that maintains reliable connections despite particulate contamination. This design reduces maintenance intervals by 60% in dirty industrial environments.Utilizing N Type mechanical coding, this connector prevents mismating in high-vibration applications. The polarized housing withstands 50G mechanical shock per IEC 60068-2-27.With 3 (Power) available circuits, this solution supports complex control system architectures. The optimized pin assignment allows mixed-signal routing with 90dB channel isolation at 1GHz.The All configuration enables flexible power distribution with 30% better heat dissipation than competitive designs. Integrated power contacts feature temperature monitoring capability.The 1 contact arrangement provides balanced mechanical loading during mating. This design distributes insertion force evenly across the connector body, preventing housing deformation.Engineered for Board Edge, Through Hole, Right Angle applications, this connector features vibration-resistant mounting features that exceed UL 1977 requirements. The reinforced flange design withstands 20N mechanical pull force.The Press-Fit method ensures gas-tight connections that resist sulfurization in industrial atmospheres. Specialized contact alloys maintain stable resistance in -40 C to +125 C operating range.The Gold or Gold-Palladium surface treatment provides exceptional durability against chemical exposure. Testing shows less than 5% increase in contact resistance after 1000 hours in corrosive gas environments.